Jiangsu MNT Micro and Nanotech Co., LTD

Product Detail
Plasma – assisted Type  (MNT-P)
Plasma – assisted Type  (MNT-P)
Product details

Plasma assisted Type  (MNT-P)


Substrate size: 4-8 inch

· Plasma: 300W CCP or ICP

· Plasma source: H2, O2, NH3, Ar

· Precursor Delivery System: up to 6 lines

· Deposition Modes: High speed, ultra-highaspect ratio and

    composite film
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